Solution cleansing

Filosofi

1. Luɔi ye looi

Në luɔɔi de luɔɔi de luɔɔi de luɔɔi de luɔɔi de luɔɔi de luɔɔi de luɔɔi de luɔɔi de luɔɔi de luɔɔi de luɔɔi de luɔɔi de luɔɔi de luɔɔi de luɔɔi

Ka tɛmɛ internet, teknoloji de kɔc kɔc kɔc kɔc kɔc kɔc kɔc kɔc kɔc kɔc kɔc kɔc kɔc kɔc kɔc kɔc kɔc kɔc kɔc kɔc kɔc kɔc kɔc kɔc kɔc kɔc kɔc kɔc kɔc kɔc kɔc kɔc kɔc kɔc k

Lɔ̈ɔ̈m ye kɔnɔŋ ye kɔnɔŋ ye kɔnɔŋ ye kɔnɔŋ ye kɔnɔŋ ye kɔnɔŋ ye kɔnɔŋ ye kɔnɔŋ ye.

2. Hitachi High-tech Cleansing Solution

<unk>Kɔl ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc
Saan juëc cï looi, akutnhom de kɔc ye luɔɔi de semiconductor manufacturing equipment, precision analysis instruments, etc.

<unk>Analyze · Analyze alien particles · pollutants<unk>
Kɔɔr juëc tɩŋa tʋmɩyɛ ne elektron mikroskop ye kɛnɛ kɛnɛ kɛnɛ kɛnɛ kɛnɛ kɛnɛ kɛnɛ kɛnɛ kɛnɛ kɛnɛ kɛnɛ kɛnɛ.

<unk>Yɔɔr kä ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc
Kɔmpaniɛn ye kɔc juëc cɔl WET / DRY cleaning technology, environmental control technology.

Tɛ̈n yenë teknoloji kɔnɔ looi, ka tɛ̈n yenë teknoloji kɔnɔ looi, ka tɛ̈n yenë teknoloji kɔnɔ looi, ka tɛ̈n yenë teknoloji kɔnɔ looi
Hitachi High-Tech ye tɛ̈n yenë kɛ̈ɛ̈l ye kɛ̈ɛ̈l ye kɛ̈ɛ̈l ye kɛ̈ɛ̈l ye kɛ̈ɛ̈l ye.

3. Luɔi wɛ̈t ye kek looi në luɔɔi ye kek looi në luɔɔi ye kek looi

A thiekic ba teknoloji ku ŋäc kɔ̈k tɔ̈ɔ̈u kɔnɔ kɔnɔ kɔnɔ kɔnɔ kɔnɔ kɔnɔ kɔnɔ kɔnɔ kɔnɔ kɔnɔ. Ku tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n

An bɛ ɣɔɔc kɔnɔ tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n

An tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ

Sistɛm kony kɛnɛya

Teknoloji Dry

Teknoloji CleanLogix

Kɔmpaniɛdɛn tɛ̈n yena tɛ̈n yena tɛ̈n yena tɛ̈n yena tɛ̈n yena tɛ̈n yena tɛ̈n yena tɛ̈n yena tɛ̈n yena tɛ

Cäät ye cɔl CMOS lens assembly process cleaning

② Automation (cïmën)

Teknoloji CO2

Teknoloji CleanLogix

Prinsip cleansing

Cäät cleansing

Ink Oil

Lens (fingerprint, ink ye kɔnɔ)

CMOS Sensor Pixel Division (Organic Materials)

Karakteristika

Lɔ̈k kä puɔth ye kek looi në CO2 particle size control technology (0.5 ~ 500μm)

• CO2 particles bɛ̈n tɔ̈ɔ̈u ka bɛ̈n tɔ̈ɔ̈u ka bɛ̈n tɔ̈ɔ̈u ka bɛ̈n tɔ̈ɔ̈u ka bɛ̈n tɔ̈ɔ̈u
• Gas ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc
• A tɛ̈n yenë a tɔ̈ɔ̈u thïn, a bɛ̈n ya cɔk tɔ̈ɔ̈u bï a cɔk tɔ̈ɔ̈u bï a cɔk tɔ̈ɔ̈u b
• A ye kɛ̈ɛ̈k ye kɛ̈ɛ̈k ye kɛ̈ɛ̈k ye kɛ̈ɛ̈k ye kɛ̈ɛ̈k ye kɛ̈ɛ̈k
  (CO2 yaa bɛ̈ɛ̈i ye bɛ̈ɛ̈i ye bɛ̈ɛ̈i ye bɛ̈ɛ̈i ye bɛ̈ɛ̈i)

Patent dɔw

US7225819B2/US6656017B2/US6802961B2/US7601112B2/US7901540B2/US8021489B2/US5725154A/US7451941B2/US9381574B1/US9352355B1/ US9387511B1/US8197603B2/US6979362B2/TWI577452B

Teknoloji Plasma

Teknoloji CleanLogix

Teknoloji ye kɛ̈ɛ̈r ye kɛ̈ɛ̈r ye kɛ̈ɛ̈r ye kɛ̈ɛ̈r ye kɛ̈ɛ̈r ye kɛ̈ɛ̈r ye k

Reactions ye rot looi në plasma processing

Karakteristika

1. Lɔ̈ɔ̈m ye kɔc cɔk cɔk cɔk cɔk cɔk cɔk cɔk cɔk cɔk cɔk cɔk cɔk cɔk cɔk cɔk cɔk cɔk
2. Teknoloji ICP ye rot looi bï plasma juëc looi
3. Plasma suguya juëc lëu bï ya luui në luɔɔi juëc yiic

CCP: Capacitively Coupled Plasma (电容Coupled等离子)
ICP: Inductively Coupled Plasma (电感Coupled Plasma)

Plasma Device's Use and Effects (Plasma Device's Use and Effects)

• A lëu bï resin ye tɔ̈u në luɔɔi de 100 ~ 20μmφ
• A lëu bï ya luɔ̈ɔ̈i në "LCP", "PFA", "PTFE" wala kɔc kɔ̈k peei në 5G ka tɛ̈n yenë kɔc ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc ye kɔc
  Ku ka bɛ̈n looi ka bɛ̈n looi ka bɛ̈n looi ka bɛ̈n looi ka bɛ̈n looi ka bɛ̈n looi ka bɛ̈n looi
• Wakt tɔ̈u tɔ̈u tɔ̈u tɔ̈u tɔ̈u tɔ̈u tɔ̈u tɔ̈u tɔ̈u tɔ̈u tɔ̈u tɔ̈u

LCP: Liquid Crystal Polymer
PFA: PerFluoroAlkoxy
PTFE: PolyTetraFluoroEthylene

Device Series

Lardɛ

<Kãsenga kä ye kek looi>

Plasma ABF (CF4+O2 gas)

Vacuum Plasma Fingerprint Sensor Descum ((CF4+O2 Gas)

<Cäät kɔnɔ kɔnɔ kɔnɔ kɔnɔ kɔnɔ kɔnɔ kɔnɔ kɔnɔ kɔnɔ kɔnɔ kɔnɔ kɔnɔ kɔnɔ kɔnɔ kɔnɔ kɔnɔ kɔnɔ kɔnɔ kɔnɔ kɔnɔ

Atmospheric pressure plasma (CDA luɔɔi)